A method for thickness determination of thin films of amalgamable metals by total-reflection X-ray fluorescence

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 267, Issue 15, 2009, Pages 2532-2537

  Bennun, L ^a   Greaves, E D ^b   Barros, H ^b   Diaz Valdes J ^a  

^a UNIVERSITY OF CONCEPCIÓN   (Chile)

^b UNIVERSIDAD SIMÓN BOLÍVAR   (Venezuela)

Author keywords

Determination; Thin film; TXRF

Indexed keywords

DETERMINATION; HOMOGENEOUS FILMS; LAYER THICKNESS; METAL LINE; RELATIVE PEAK INTENSITY; SURFACE DENSITY; THICKNESS DETERMINATION; TXRF; X RAY FLUORESCENCE;

DATA PROCESSING; FLUORESCENCE; MERCURY (METAL); THIN FILM DEVICES; THIN FILMS;

FILM THICKNESS;

EID: 67650003290     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2009.04.018     Document Type: Article

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