The Metrological Basis and Operation of Nanopositioning and Nanomeasuring Machine NMM-1

Technisches Messen

Volumn 76, Issue 5, 2009, Pages 227-234

  Jäger, Gerd ^a   Manske, Eberhard ^a   Hausotte, Tino ^a   Büchner, Hans Joachim ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Metrological analysis; Multi beam interferometers; Nanomeasuring machine nMM 1; Optical and tactile nanoprobes

Indexed keywords

MEASURE AND CONTROLS; METROLOGICAL ANALYSIS; MULTI-BEAM INTERFEROMETER; NANO-POSITIONING; NANO-POSITIONING STAGES; NANOMEASURING; NANOPOSITIONING AND NANOMEASURING MACHINES; SIX DEGREES OF FREEDOM;

INTERFEROMETERS; NANOPROBES; THREE DIMENSIONAL;

PRECISION ENGINEERING;

EID: 67649987678     PISSN: 01718096     EISSN: None     Source Type: Journal    
DOI: 10.1524/teme.2009.0960     Document Type: Conference Paper

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