-
6
-
-
18744380411
-
-
Choi J H, Lee E S, Baik H K, Lee S-J, Song K M and Lim Y S 2005 Plasma Sources Sci. Technol. 14 363
-
(2005)
Plasma Sources Sci. Technol.
, vol.14
, Issue.2
, pp. 363
-
-
Choi, J.H.1
Lee, E.S.2
Baik, H.K.3
Lee, S.-J.4
Song, K.M.5
Lim, Y.S.6
-
10
-
-
0032138693
-
-
Jeong J Y, Babayan S E, Tu V J, Park J, Henins I, Hicks R F and Selwyn G S 1998 Plasma Sources Sci. Technol. 7 282
-
(1998)
Plasma Sources Sci. Technol.
, vol.7
, Issue.3
, pp. 282
-
-
Jeong, J.Y.1
Babayan, S.E.2
Tu, V.J.3
Park, J.4
Henins, I.5
Hicks, R.F.6
Selwyn, G.S.7
-
11
-
-
23844466907
-
-
Nowling G R, Yajima M, Babayan S E, Moravej M, Yang X, Hoffman W and Hicks R F 2004 Plasma Sources Sci. Technol. 14 477
-
(2004)
Plasma Sources Sci. Technol.
, vol.14
, pp. 477
-
-
Nowling, G.R.1
Yajima, M.2
Babayan, S.E.3
Moravej, M.4
Yang, X.5
Hoffman, W.6
Hicks, R.F.7
-
15
-
-
0033077924
-
-
Kiyokawa K, Matsuoka H, Itou A, Hasegawa K and Sugiyama K 1999 Surf. Coat. Technol. 112 25
-
(1999)
Surf. Coat. Technol.
, vol.112
, Issue.1-3
, pp. 25
-
-
Kiyokawa, K.1
Matsuoka, H.2
Itou, A.3
Hasegawa, K.4
Sugiyama, K.5
-
18
-
-
31744446380
-
-
Choi J H, Han I, Baik H K, Lee M H, Han D-W, Park J-C, Lee I-S, Song K M and Lim Y S 2006 J. Electrostat. 64 17
-
(2006)
J. Electrostat.
, vol.64
, Issue.1
, pp. 17
-
-
Choi, J.H.1
Han, I.2
Baik, H.K.3
Lee, M.H.4
Han, D.-W.5
Park, J.-C.6
Lee, I.-S.7
Song, K.M.8
Lim, Y.S.9
-
26
-
-
0035452472
-
-
Jansen H, de Boer M, Wensink H, Kloeck B and Elwenspoek M 2001 Microelectron. J. 32 769
-
(2001)
Microelectron. J.
, vol.32
, Issue.9
, pp. 769
-
-
Jansen, H.1
De Boer, M.2
Wensink, H.3
Kloeck, B.4
Elwenspoek, M.5
-
27
-
-
57049113928
-
-
Ishihara D, Noma Y, Stauss S, Sai M, Tomai T and Terashima K 2006 Proc. 3rd Int. Workshop on Microplasma (Greifswald, Germany) p 163
-
(2006)
Proc. 3rd Int. Workshop on Microplasma
, pp. 163
-
-
Ishihara, D.1
Noma, Y.2
Stauss, S.3
Sai, M.4
Tomai, T.5
Terashima, K.6
-
28
-
-
51849130991
-
-
Ishihara D, Noma Y, Stauss S, Sai M, Tomai T and Terashima K 2008 Plasma Sources Sci. Technol. 17 035008
-
(2008)
Plasma Sources Sci. Technol.
, vol.17
, Issue.3
, pp. 035008
-
-
Ishihara, D.1
Noma, Y.2
Stauss, S.3
Sai, M.4
Tomai, T.5
Terashima, K.6
-
29
-
-
51349134757
-
-
Noma Y, Choi J H, Stauss S, Tomai T and Terashima K 2008 Appl. Phys. Express 1 046001
-
(2008)
Appl. Phys. Express
, vol.1
, pp. 046001
-
-
Noma, Y.1
Choi, J.H.2
Stauss, S.3
Tomai, T.4
Terashima, K.5
-
33
-
-
0032022902
-
-
Massines F, Gadri R B, Rabehi A, Decomps Ph, Ségur P and Mayoux Ch 1998 J. Appl. Phys. 83 2950
-
(1998)
J. Appl. Phys.
, vol.83
, Issue.6
, pp. 2950
-
-
Massines, F.1
Gadri, R.B.2
Rabehi, A.3
Ph, D.4
Ségur, P.5
Ch, M.6
-
36
-
-
33745622460
-
-
Choi J H, Lee T I, Han I, Baik H K, Song K M, Lim Y S and Lee E S 2006 Plasma Sources Sci. Technol. 15 416
-
(2006)
Plasma Sources Sci. Technol.
, vol.15
, Issue.3
, pp. 416
-
-
Choi, J.H.1
Lee, T.I.2
Han, I.3
Baik, H.K.4
Song, K.M.5
Lim, Y.S.6
Lee, E.S.7
-
37
-
-
21144432955
-
-
Somekawa T, Shirafuji T, Sakai O, Tachibana K and Matsunaga K 2005 J. Phys. D: Appl. Phys. 38 1910
-
(2005)
J. Phys. D: Appl. Phys.
, vol.38
, Issue.12
, pp. 1910
-
-
Somekawa, T.1
Shirafuji, T.2
Sakai, O.3
Tachibana, K.4
Matsunaga, K.5
-
42
-
-
43249086309
-
-
Li X, Zhao N, Fang T, Liu Z, Li L and Dong L-F 2008 Plasma Sources Sci. Technol. 17 015017
-
(2008)
Plasma Sources Sci. Technol.
, vol.17
, Issue.1
, pp. 015017
-
-
Li, X.1
Zhao, N.2
Fang, T.3
Liu, Z.4
Li, L.5
Dong, L.-F.6
-
49
-
-
21044432679
-
-
Brandenburg R, Maiorov V A, Golubovskii Yu B, Wagner H-E, Behnke J and Behnke J F 2005 J. Phys. D: Appl. Phys. 38 2187
-
(2005)
J. Phys. D: Appl. Phys.
, vol.38
, Issue.13
, pp. 2187
-
-
Brandenburg, R.1
Maiorov, V.A.2
Golubovskii Yu, B.3
Wagner, H.-E.4
Behnke, J.5
Behnke, J.F.6
-
51
-
-
36549041386
-
-
Luo H, Liang Z, Lv B, Wang X, Guan Z and Wang L 2007 Appl. Phys. Lett. 91 221504
-
(2007)
Appl. Phys. Lett.
, vol.91
, Issue.22
, pp. 221504
-
-
Luo, H.1
Liang, Z.2
Lv, B.3
Wang, X.4
Guan, Z.5
Wang, L.6
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