Surface analysis of fluorine-containing thin films fabricated by various plasma polymerization methods

Surface and Coatings Technology

Volumn 203, Issue 20-21, 2009, Pages 3129-3135

  Kim, Youngsoo ^a   Kim, Kang Jin ^a   Lee, Yeonhee ^b  

^a Korea University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

CCP; Hydrophobic; ICP; Plasma polymerization; PSII; Surface analysis

Indexed keywords

ANALYTICAL INSTRUMENT; ATOMIC FORCE MICROSCOPES; CAPACITIVELY COUPLED PLASMAS; CCP; CHEMICAL COMPOSITIONS; COUPLED PLASMA; CROSS-SECTION IMAGES; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; HYDROPHOBIC; HYDROPHOBIC PROPERTIES; HYDROPHOBIC SURFACES; ICP; NEAR EDGE X RAY ABSORPTION FINE STRUCTURE; PLASMA METHODS; PLASMA POLYMER SURFACES; PLASMA POLYMERS; POLYMERIZATION METHOD; PSII; PULSED-PLASMA; SELF-IGNITION PLASMAS; SEM; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY; TOF-SIMS ANALYSIS; WATER CONTACT ANGLE MEASUREMENT; XPS;

ABSORPTION SPECTROSCOPY; ACETYLENE; ANGLE MEASUREMENT; ATOMIC SPECTROSCOPY; CONTACT ANGLE; DEPOSITION RATES; EMISSION SPECTROSCOPY; FLUORINE; FUNCTIONAL GROUPS; HYDROPHOBICITY; INDUCTIVELY COUPLED PLASMA; LIGHTING; MICROSCOPES; PLASMA DIAGNOSTICS; PLASMA POLYMERIZATION; POLYMER FILMS; POLYMERS; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SPECTRUM ANALYSIS; SURFACE ANALYSIS; SURFACE CHEMISTRY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA DEPOSITION;

EID: 67349278793     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.03.039     Document Type: Article

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