Inline metrology configuration for sub-wavelength diffraction using microscope optics

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 1036-1039

  Kehoe, Timothy ^a,b   Reboud, Vincent ^a   Torres, Clivia Sotomayor ^a,c  

^a CATALAN INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY ICN2   (Spain)

^b UNIVERSITY COLLEGE CORK   (Ireland)

^c INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS ICREA   (Spain)

Author keywords

Diffraction; Inline measurement; Metrology; Nanoimprint lithography; Sub wavelength

Indexed keywords

IN LINES; IN-LINE METROLOGIES; INLINE MEASUREMENT; LITHOGRAPHIC PROCESS; METROLOGY; MICROSCOPE OPTICS; NANO-IMPRINTING PROCESS; OPTICAL ARRANGEMENTS; OPTICAL METROLOGIES; SCATTERED LIGHTS; SUB-WAVELENGTH;

DIFFRACTION; FINITE DIFFERENCE TIME DOMAIN METHOD; MEASUREMENTS; NANOIMPRINT LITHOGRAPHY; PROCESS MONITORING;

LIGHT;

EID: 67349251563     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.01.072     Document Type: Article

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