Optical properties of ZnO nanoparticles embedded in a silicon nitride layer formed by sputtering and thermal treatment

Current Applied Physics

Volumn 9, Issue 2 SUPPL., 2009, Pages

  Oh, Do Hyun ^a,b   Cho, Woon Jo ^a   Kim, Tae Whan ^b  

^a Korea Institute of Science and Technology   (South Korea)

^b Hanyang University   (South Korea)

Author keywords

Optical properties; Silicon nitride layer; Thermal annealing treatment; ZnO nanoparticles

Indexed keywords

EMISSION PEAKS; HIGH QUALITY; PHOTOLUMINESCENCE SPECTRUM; PL SPECTRA; SI(1 0 0); THERMAL ANNEALING TREATMENT; THERMAL TREATMENT; TRANSMISSION ELECTRON MICROSCOPY IMAGES; ULTRA-VIOLET; VISIBLE RANGE; ZNO NANOPARTICLES; ZNO THIN FILM;

ANNEALING; EMISSION SPECTROSCOPY; FILM PREPARATION; FILM THICKNESS; MULTILAYERS; OPTICAL PROPERTIES; SEMICONDUCTING ZINC COMPOUNDS; SILICON NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; ZINC OXIDE;

NANOPARTICLES;

EID: 67349246749     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2008.12.053     Document Type: Article

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