Atmospheric pressure chemical vapour deposition of thermochromic tungsten doped vanadium dioxide thin films for use in architectural glazing

Thin Solid Films

Volumn 517, Issue 16, 2009, Pages 4565-4570

  Blackman, Christopher S ^a   Piccirillo, C ^a   Binions, R ^a   Parkin, Ivan P ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

Chemical vapor deposition (CVD); Thermochromic; Tungsten doping; Vanadium oxide

Indexed keywords

CHEMICAL VAPOUR DEPOSITIONS; ENERGY SAVINGS; GAS-PHASE; GLASS PRODUCTS; HIGH QUALITIES; OPTICAL TRANSMISSIONS; REFLECTANCE SPECTROSCOPIES; SWITCHING TEMPERATURES; THERMOCHROMIC; TRANSITION TEMPERATURES; TUNGSTEN DOPING; VANADIUM DIOXIDE THIN FILMS; VANADIUM OXIDE; VARIABLE TEMPERATURES; X- RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

ARCHITECTURAL ACOUSTICS; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; DIAMOND FILMS; DOPING (ADDITIVES); OPTICAL FILMS; OPTICAL PROPERTIES; OXIDES; SCANNING ELECTRON MICROSCOPY; SPECTRUM ANALYSIS; THIN FILMS; TRANSITION METALS; TUNGSTEN; VANADIUM; VANADIUM ALLOYS; VANADIUM COMPOUNDS; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL VAPOR DEPOSITION;

EID: 67349164756     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.12.050     Document Type: Article

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