Ion beam assisted deposition of nitrogen-containing chromium films: A comparison of argon vs nitrogen ions

Surface and Coatings Technology

Volumn 203, Issue 17-18, 2009, Pages 2763-2766

  Ensinger, W ^a   Kiuchi, M ^b  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Chromium nitride; Dynamic ion beam mixing; Ion beam assisted deposition (IBAD); Scanning tunneling microscopy

Indexed keywords

ARGON-IONS; ASSISTED DEPOSITIONS; CHROMIUM FILMS; CHROMIUM NITRIDE; DIFFERENT SUBSTRATES; ION BEAM ASSISTED DEPOSITION (IBAD); ION IRRADIATION INTENSITIES; ION IRRADIATIONS; IONIC SPECIES; NITROGEN CONTENTS; NITROGEN GAS; NITROGEN ION IMPLANTATIONS; NITROGEN IONS; NITROGEN IRRADIATIONS; PHASE MIXTURES; RARE GAS; RESIDUAL GAS;

ARGON; BEAM PLASMA INTERACTIONS; CHROMIUM; GASES; ION BEAMS; ION BOMBARDMENT; ION IMPLANTATION; IONS; METALLIC FILMS; NITRIDES; NITROGEN; RADIATION; SCANNING; SCANNING TUNNELING MICROSCOPY; SORPTION;

ION BEAM ASSISTED DEPOSITION;

EID: 67349155283     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.02.118     Document Type: Article

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