Fabrication and electrical characterization of Au/p-Si/STO/Au contact

Current Applied Physics

Volumn 9, Issue 5, 2009, Pages 933-936

  Gupta, R K ^a   Ghosh, K ^a   Kahol, P K ^a  

^a MISSOURI STATE UNIVERSITY   (United States)

Author keywords

Barrier height; Ideality factor; Pulsed laser; Strontium titanate; Thin films

Indexed keywords

BARRIER HEIGHT; ELECTRICAL CHARACTERIZATIONS; FORWARD BIAS; I-V CHARACTERISTICS; IDEAL DIODES; IDEALITY FACTOR; JUNCTION PARAMETERS; PULSED LASER; PULSED-LASER DEPOSITION TECHNIQUES; RECTIFICATION BEHAVIORS; ROOM TEMPERATURES; SERIES RESISTANCES; STRONTIUM TITANATE;

ELECTRIC RECTIFIERS; LASERS; PULSED LASER DEPOSITION; STRONTIUM; STRONTIUM COMPOUNDS; THIN FILMS;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 67349112684     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2008.09.007     Document Type: Article

References (22)

1. Ruotolo A., Lam C.Y., Cheng W.F., Wong K.H., and Leung C.W. Phys. Rev. B 76 (2007) 075122
2. Luo Z., Hao J.H., and Gao J. Appl. Phys. Lett. 91 (2007) 062105
3. Hu X.M., Li H., Liang Y., Wei Y., Yu Z., Marshall D., Edwards J., Droopad R., Zhang X., Demkov A.A., Moore K., and Kulik J. Appl. Phys. Lett. 82 (2003) 203
4. Shanthi N., and Sarma D.D. Phys. Rev. B 57 (1998) 2153
5. Tanaka H., Zhang J., and Kawai T. Phys. Rev. Lett. 88 (2002) 027204
6. Guo H., Huang Y., Jin K., Zhou Q., Lu H., Liu L., Zhou Y., Cheng B., and Chen Z. Appl. Phys. Lett. 86 (2005) 123502
7. Zhao K., Huang Y., Zhou Q., Jin K.J., Lu H., He M., Cheng B., Zhou Y., Chen Z., and Yang G. Appl. Phys. Lett. 86 (2005) 221917
8. Gupta R.K., Ghosh K., Mishra S.R., and Kahol P.K. Appl. Surf. Sci. 254 (2008) 4018
9. Ki{dotless}li{dotless}çoǧlu T. Thin Solid Films 516 (2008) 967
10. Karatasa S., and Turut A. Vacuum 74 (2004) 45
11. Wang C.X., Yang G.W., Liu H.W., Han Y.H., Luo J.F., Gao C.X., and Zou G.T. Appl. Phys. Lett. 84 (2004) 2427
12. Singh R., and Narula A.K. Appl. Phys. Lett. 71 (1997) 2845
13. Ajimsha R.S., Vanaja K.A., Jayaraj M.K., Misra P., Dixit V.K., and Kukreja L.M. Thin Solid Films 515 (2007) 7352
14. Sugiura M., Uragou K., Tachiki M., and Kobayashi T. J. Appl. Phys. 90 (2001) 187
15. Campbell A.J., Bradley D.D.C., and Lidzey D.G. J. Appl. Phys. 82 (1997) 6326
16. Forrest S.R. Chem. Rev. 97 (1997) 1793
17. Aydin M.E., and Turut A. Microelectron. Eng. 84 (2007) 2875
18. Gullu O., Aydogan S., and Turut A. Microelectron. Eng. 85 (2008) 1647
19. Turut A., Saglam M., and Turut A. Microelectron. Eng. 85 (2008) 278
20. Cheung S.K., and Cheung N.W. Appl. Phys. Lett. 49 (1986) 85
21. Kilicoglu T. Thin Solid Films 516 (2008) 967
22. Norde H. J. Appl. Phys. 50 (1979) 5052