Investigations on HCl contaminated Cu 200 mm wafers using Parallel Angle Resolved XPS

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 1013-1016

  Pelissier, B ^a   Beaurain, A ^a   Fontaine, H ^b   Danel, A ^b   Joubert, O ^a  

^a CNRS   (France)

^b CEA LETI   (France)

Author keywords

Cl contamination; Clean room queue time; Cu contamination; Parallel angle resolved XPS; Wafer contamination; XPS

Indexed keywords

CL CONTAMINATION; CU CONTAMINATION; PARALLEL ANGLE RESOLVED XPS; WAFER CONTAMINATION; XPS;

CLEAN ROOMS; INDOOR AIR POLLUTION; PASSIVATION; QUEUEING THEORY; THICKNESS MEASUREMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

CONTAMINATION;

EID: 67349091778     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.01.025     Document Type: Article

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