Performance of UV and UV/H2O2 processes for the removal of pharmaceuticals detected in secondary effluent of a sewage treatment plant in Japan

Journal of Hazardous Materials

Volumn 166, Issue 2-3, 2009, Pages 1134-1140

  Kim, Ilho ^a   Yamashita, Naoyuki ^a   Tanaka, Hiroaki ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

AOPs; LC MS MS; Pharmaceuticals; UV; UV H2O2

Indexed keywords

AOPS; LC/MS/MS; PHARMACEUTICALS; UV; UV/H2O2;

CHEMICAL OXYGEN DEMAND; EFFLUENT TREATMENT; EFFLUENTS; REMOVAL; SEWAGE; SEWAGE TREATMENT; SEWAGE TREATMENT PLANTS; WASTEWATER; WASTEWATER TREATMENT;

ANTIBIOTICS;

ANALGESIC AGENT; ANTIBIOTIC AGENT; AZITHROMYCIN; CLARITHROMYCIN; DICLOFENAC; ERYTHROMYCIN; HYDROGEN PEROXIDE; KETOPROFEN; MACROLIDE; PHENAZONE;

ANTIBIOTICS; EFFLUENT; EXPERIMENTAL DESIGN; HYDROGEN PEROXIDE; LIQUID CHROMATOGRAPHY; MASS SPECTROMETRY; PERFORMANCE ASSESSMENT; POLLUTANT REMOVAL; SEWAGE TREATMENT; ULTRAVIOLET RADIATION;

ARTICLE; EFFLUENT; JAPAN; RADIATION ENERGY; SEWAGE TREATMENT PLANT; ULTRAVIOLET RADIATION; WASTE WATER;

ANALGESICS; ANTI-BACTERIAL AGENTS; ANTIPYRINE; DICLOFENAC; HYDROGEN PEROXIDE; JAPAN; KETOPROFEN; MACROLIDES; PHARMACEUTICAL PREPARATIONS; PILOT PROJECTS; SANITARY ENGINEERING; SEWAGE; ULTRAVIOLET RAYS;

EID: 67349084362     PISSN: 03043894     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2008.12.020     Document Type: Article

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