Grazing incidence mirrors for EUV lithography

Proceedings of the International Semiconductor Conference, CAS

Volumn 2, Issue , 2008, Pages 267-270

  Braic, V ^a   Balaceanu, M ^a   Braic, M ^a  

^a NATIONAL INSTITUTE FOR OPTOELECTRONICS   (Romania)

Author keywords

EUV lithography; Microchemical and optical properties; Multilayered coatings; Zrn TiN

Indexed keywords

AFM; D.C. MAGNETRON SPUTTERING; DIFFERENT SUBSTRATES; EUV LITHOGRAPHY; EUV RADIATION; EUV REFLECTIVITY; EUVL SYSTEMS; EXTREME UV LITHOGRAPHIES; GRAZING INCIDENCE; HIGH REFLECTIVITY; LITHOGRAPHY SYSTEMS; MICROCHEMICAL AND OPTICAL PROPERTIES; MULTI-LAYERED; MULTILAYERED COATINGS; TECHNOLOGY NODES; XRD; ZRN/TIN;

COATINGS; LITHOGRAPHY; MIRRORS; OPTICAL PROPERTIES; OPTICS; REFLECTION; SYNCHROTRON RADIATION; ULTRAVIOLET DEVICES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 67249165399     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SMICND.2008.4703399     Document Type: Conference Paper

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