Microwave and hot filament chemical vapour deposition of diamond multilayers on Si and WC-Co substrates

Microelectronics Journal

Volumn 38, Issue 1, 2007, Pages 20-23

  Kadlecikova M ^a   Vojs, M ^a   Breza, J ^a   Vesely M ^a   Frgala, Z ^b   Michalka, M ^c   Matejkova J ^d   Vojackova A ^a   Danis T ^a   Marton, M ^a  

^a SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

^b MASARYK UNIVERSITY   (Czech Republic)

^c INTERNATIONAL LASER CENTER   (Slovakia)

^d INSTITUTE OF SCIENTIFIC INSTRUMENTS   (Czech Republic)

Author keywords

Chemical vapour deposition; Nanocrystalline diamond; Raman spectroscopy; Scanning electron microscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMONDS; MULTILAYERS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY;

DIAMOND COATINGS; HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HF CVD); MICROWAVE CHEMICAL VAPOR DEPOSITION (MW CVD); NANOCRYSTALLINE DIAMOND;

MICROWAVES;

EID: 33845200055     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2006.10.006     Document Type: Article

References (4)

1. Kadlečíková M., Breza J., Veselý M., Frgala Z., Kudrle V., Janča J., Janík J., and Buršík J. Raman bands in microwave plasma assisted chemical vapour deposited films. Microelectron. J. 24 (2003) 1075
2. Vojs M., Veselý M., Redhammer R., Janík J., Kadlečíková M., Daniš T., Marton M., Michalka M., and Šutta P. Double bias HFCVD multilayer diamond films on WC-Co cutting tools. Diamond Relat. Mater. 14 (2005) 613-616
3. Subramanian K., Kang W.G., Davidson J.L., and Hofmeister W.H. The effect of growth rate control on the morphology of nanocrystalline diamond. Diamond Relat. Mater. 14 (2005) 404-410
4. Prawer S., Nugent K.W., Jamieson D.N., Orwa J.O., Bursill L.A., and Peng J.L. The Raman spectrum of nanocrystalline diamond. Chem. Phys. Lett. 332 (2000) 93-97