Large-scale double-patterning compliant layouts for DP engine and design rule development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7275, Issue , 2009, Pages

  Cork, Christopher ^a   Lucas, Kevin ^b   Hapli, John ^c   Raffard, Herve ^a   Barnes, Levi ^b  

^a Rue Lavoisier   (France)

^b SYNOPSYS INC   (United States)

^c Synopsys Canada   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ASIC DESIGN; DESIGN RULES; DESIGN STAGE; DIFFERENT SIZES; DOUBLE PATTERNING; LARGE DATASETS; LARGE DESIGNS; MICRO LEVEL; MOORE'S LAW; MULTIPLE LAYERS; MULTIPLE PROCESSORS; PHASE-SHIFT MASK; STANDARD CELL;

APPLICATION SPECIFIC INTEGRATED CIRCUITS; CELL MEMBRANES; COLORING; ELECTRIC BATTERIES; ELECTRIC POWER SUPPLIES TO APPARATUS; ENGINES; EXTREME ULTRAVIOLET LITHOGRAPHY; INTEGRATED CIRCUITS; MACHINE DESIGN; MASKS; STANDARDS;

REGULATORY COMPLIANCE;

EID: 66749148537     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.815213     Document Type: Conference Paper

References (8)

1. Liebmann, L. "DFM lessons learnt from alt-PSM design." Proc SPIE Vol. 6925, (2008)
2. Drapeau, M., et al. "Patterning Design Split Implementation and Validation for the 32nm Node." Proc. SPIE Vol. 6521 (2007)
3. Cork, C., "Checking design conformance and optimizing manufacturability using automated Double Patterning decomposition." Proc. SPIE Vol. 6925 (2008)
4. Lucas, K., Double patterning interactions with wafer processing, OPC and physical design flows. Proc. SPIE Vol. 6924 (2008)
5. Lucas, K., "Physical design and mask synthesis considerations for DPT", Immersion Symposium 2008, The Hague.
6. Ballhorn, G., "Slashing Turn around time by introducing distributed processing" Proc. SPIE Vol. 4562, p. 183-193, 21st Annual BACUS Symposium on Photomask Technology. 2001
7. Lugg, R., "An Effective Distributed Architecture for OPC & RET Applications", Proc SPIE, p. 903-908 Vol. 4889. 2002
8. Boman, M., "Efficient hardware usage in the mask tapeout flow" Proc. SPIE Vol 7274-100 (2009)