Efficient hardware usage in the mask tapeout flow

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Boman, Mathias ^a   Brist, Travis ^a   Wang, Yongdong ^a  

^a SYNOPSYS INC   (United States)

Author keywords

EDA; Hardware usage; Mask tapeout flow; Parallel processing; RET TAT

Indexed keywords

CPU RESOURCES; CRITICAL LAYER; EDA; ELECTRONIC DESIGN AUTOMATION SUPPLIERS; HARDWARE RESOURCES; INPUT/OUTPUT; NEW TECHNOLOGIES; NUMBER OF LAYERS; OPTICAL PROXIMITY CORRECTIONS; PARALLEL PROCESSING; RET TAT; SOFTWARE PERFORMANCE; TIME SPENT;

COMPUTER AIDED DESIGN; TURNAROUND TIME;

HARDWARE;

EID: 65849209101     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.815019     Document Type: Conference Paper

References (1)

1. Greg Hughes and Henry Yun, "Mask Industry Assessment: 2008", Proc. of SPIE Vol. 7122 712204 (2008)