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Volumn 7272, Issue , 2009, Pages

Simulation of secondary electron emission in helium ion microscope for overcut and undercut line-edge patterns

Author keywords

CD metrology; Edge contrast; Helium ion microscope; Monte Carlo simulation; Pseudo image formation; Scanning electron microscopy; Scanning ion microscope; Secondary electron emission

Indexed keywords

CD METROLOGY; EDGE CONTRAST; HELIUM ION MICROSCOPE; MONTE CARLO SIMULATION; PSEUDO-IMAGE FORMATION; SCANNING ION MICROSCOPE; SECONDARY ELECTRON EMISSION;

EID: 66649136724     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813889     Document Type: Conference Paper
Times cited : (10)

References (29)
  • 6
    • 0000665894 scopus 로고
    • H. Ehrentrich, D. Turnbull (Eds.), Academic, Boston
    • P.M. Echenique, F. Flore, R.H. Ritchie, in: H. Ehrentrich, D. Turnbull (Eds.), Solid State Physics, Vol.43, Academic, Boston, 1990, p.230.
    • (1990) Solid State Physics , vol.43 , pp. 230
    • Echenique, P.M.1    Flore, F.2    Ritchie, R.H.3
  • 17
    • 66649109273 scopus 로고
    • D.R. Lite (Ed.), CRC, Boca Raton
    • D.R. Lite (Ed.), Handbook of Chemistry and Physics, CRC, Boca Raton, 1993, p.12 105.
    • (1993) Handbook of Chemistry and Physics , pp. 12105
  • 22


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.