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Volumn 7272, Issue , 2009, Pages
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Simulation of secondary electron emission in helium ion microscope for overcut and undercut line-edge patterns
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Author keywords
CD metrology; Edge contrast; Helium ion microscope; Monte Carlo simulation; Pseudo image formation; Scanning electron microscopy; Scanning ion microscope; Secondary electron emission
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Indexed keywords
CD METROLOGY;
EDGE CONTRAST;
HELIUM ION MICROSCOPE;
MONTE CARLO SIMULATION;
PSEUDO-IMAGE FORMATION;
SCANNING ION MICROSCOPE;
SECONDARY ELECTRON EMISSION;
DATA STORAGE EQUIPMENT;
ELECTRON BEAMS;
ELECTRONS;
HELIUM;
ION BEAMS;
ION MICROSCOPES;
MEASUREMENTS;
MONTE CARLO METHODS;
PROCESS CONTROL;
RADIOACTIVITY;
SCANNING;
SCANNING ELECTRON MICROSCOPY;
SECONDARY EMISSION;
SILICON;
SPONTANEOUS EMISSION;
IONS;
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EID: 66649136724
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.813889 Document Type: Conference Paper |
Times cited : (10)
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References (29)
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