|
Volumn 94, Issue 21, 2009, Pages
|
Dynamics of strain relaxation studied by in situ x-ray diffraction immediately after layer heteroepitaxy
|
Author keywords
[No Author keywords available]
|
Indexed keywords
DEGREE OF RELAXATION;
DENSITY OF DISLOCATION;
GAAS;
HETEROEPITAXY;
HIGH RESOLUTION;
IN-SITU;
LAYER GROWTH;
PLASTIC RELAXATION;
TEMPORAL DEVELOPMENT;
TIME CONSTANTS;
DIFFRACTION;
EPITAXIAL GROWTH;
SEMICONDUCTING ZINC COMPOUNDS;
STRAIN CONTROL;
STRAIN RELAXATION;
X RAY DIFFRACTION;
|
EID: 66549129840
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.3143630 Document Type: Article |
Times cited : (4)
|
References (12)
|