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Applied Physics Letters

Volumn 94, Issue 21, 2009, Pages

Hot-electron characteristics in chemically resolved electrical measurements of thin silica and SiON layers

(3) Rozenblat, A a Rosenwaks, Y a Cohen, H b

a TEL AVIV UNIVERSITY (Israel)

b WEIZMANN INSTITUTE OF SCIENCE (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT MEASUREMENTS; ELECTRICAL MEASUREMENT; GATE OXIDE; HOT-ELECTRON TRANSPORT; METALLIC PADS; POOLE-FRENKEL; STANDARD MEASUREMENTS; THICKNESS DEPENDENCE; THIN DIELECTRIC LAYER;

ELECTRIC VARIABLES MEASUREMENT; ELECTRON TRANSITIONS; ELECTRON TRANSPORT PROPERTIES; SILICA;

METALLIC COMPOUNDS;

EID: 66549096617 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3141454 Document Type: Article

Times cited : (8)

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