High-efficiency silicon immersion grating by electron-beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7014, Issue , 2008, Pages

  Ikeda, Yuji ^a   Kobayashi, Naoto ^b   Terada, Hiroshi ^c   Shibayama, Akinori ^d   Ozawa, Akira ^d   Yasui, Chikako ^b   Kondo, Sohei ^b   Pyo, Tae Soo ^b   Kawakita, Hideyo ^e  

^a Photocoding   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c NATIONAL ASTRONOMICAL OBSERVATORY OF JAPAN   (Japan)

^d NTT Advanced Technology Corporation   (Japan)

^e KYOTO SANGYO UNIVERSITY   (Japan)

Author keywords

High resolution; Immersion grating; Infrared; Optical device; Spectroscopy

Indexed keywords

ANISOTROPIC WET ETCHING; CONTACT METHODS; CONTACT SURFACE; EB LITHOGRAPHY; ETCHED GRATINGS; FLAT SUBSTRATES; HIGH EFFICIENCY; HIGH INCIDENCE; HIGH RESOLUTION; HIGH-RESOLUTION SPECTROMETER; IMMERSION GRATING; INFRARED; LASER INTERFEROMETER; NEAR INFRARED REGION; OPTICAL PERFORMANCE; PHOTOLITHOGRAPHY MASKS; POLISHING PROCESS; REFLECTION LOSS; RELATIVE DIFFRACTION EFFICIENCY; SCATTERED LIGHT; SILICON PRISMS; THIN SILICON SUBSTRATE; VISIBLE LASERS;

ASTRONOMICAL SATELLITES; ASTROPHYSICS; DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; INFRARED SPECTROMETERS; INFRARED SPECTROSCOPY; INSTRUMENTS; INTERFEROMETERS; LASER APPLICATIONS; LASER INTERFEROMETRY; LASERS; LIGHT; LIGHTING; OPTICAL TESTING; SPECTROMETRY; SURFACE ROUGHNESS;

SUBSTRATES;

EID: 66249117346     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.788126     Document Type: Conference Paper

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