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Volumn 23, Issue 5, 2009, Pages 196-199

Deposition of osmium and ruthenium thin films from organometallic cluster precursors

Author keywords

Alloy; Cluster; CVD; Osmium; Ruthenium

Indexed keywords

CLUSTER; CVD; HETEROMETALLIC CLUSTERS; HOMOMETALLIC CLUSTERS; ORGANOMETALLIC CLUSTERS; ORGANOMETALLIC PRECURSORS;

ALLOYS; CHEMICAL VAPOR DEPOSITION; ORGANOMETALLICS; OSMIUM; RUTHENIUM;

RUTHENIUM ALLOYS;

EID: 65949118469 PISSN: 02682605 EISSN: 10990739 Source Type: Journal
DOI: 10.1002/aoc.1494 Document Type: Article

Times cited : (7)

References (15)

1
- 0003625270
- M.L. Hitchman, K.F. Jensen, Eds, Academic Press: London
- M.L. Hitchman, K.F. Jensen, (Eds), Chemical Vapor Deposition: Principles and Applications. Academic Press: London, 1993.
- (1993) Chemical Vapor Deposition: Principles and Applications

2
- 0032939078
- a) H. Inoue, K. Satoh, Bull. Chem. Soc. Jpn. 1999, 72, 121;
- (1999) Bull. Chem. Soc. Jpn , vol.72 , pp. 121
- Inoue, H.¹ Satoh, K.²

3
- 0345633668
- b) Y. Hayakawa, K. Fukuzaki, S. Kohiki, Y. Shibata, T. Matsuo, K. Wagatsuma, M. Oku, Thin Solid Films 1999, 347, 56;
- (1999) Thin Solid Films , vol.347 , pp. 56
- Hayakawa, Y.¹ Fukuzaki, K.² Kohiki, S.³ Shibata, Y.⁴ Matsuo, T.⁵ Wagatsuma, K.⁶ Oku, M.⁷

4
- 0000244980
- c) R. Rella, P. Siciliano, L. Vasanelli, C. Gerardi, A. Licciulli, J. Appl. Phys. 1998, 83, 2369.
- (1998) J. Appl. Phys , vol.83 , pp. 2369
- Rella, R.¹ Siciliano, P.² Vasanelli, L.³ Gerardi, C.⁴ Licciulli, A.⁵

5
- 0029238319
- C. J. Smart, A. Gulhati, S. K. Reynolds, Mater. Res. Soc. Symp. Proc. 1995, 363, 207.
- (1995) Mater. Res. Soc. Symp. Proc , vol.363 , pp. 207
- Smart, C.J.¹ Gulhati, A.² Reynolds, S.K.³

6
- 0028492797
- A. Tanaka, J. Electro. Microsc. 1994, 43, 177.
- (1994) J. Electro. Microsc , vol.43 , pp. 177
- Tanaka, A.¹

7
- 0000587714
- A. D. Berr, D. J. Brown, R. Kaplan, E. J. Cukauskas, J. Vac. Sci. Technol. 1986, 4, 215.
- (1986) J. Vac. Sci. Technol , vol.4 , pp. 215
- Berr, A.D.¹ Brown, D.J.² Kaplan, R.³ Cukauskas, E.J.⁴

8
- 0000694668
- E. P. Boyd, D. R. Ketchum, H. Deng, S. G. Shore, Chem. Mater. 1997, 9, 1154.
- (1997) Chem. Mater , vol.9 , pp. 1154
- Boyd, E.P.¹ Ketchum, D.R.² Deng, H.³ Shore, S.G.⁴

9
- 0006109401
- Y. Senzaki, D. Colombo, W.L. Gladfelter, F.B. McCormick, Proc. Electrochem. Soc. 1997, 97-25, 933.
- (1997) Proc. Electrochem. Soc , vol.97 -25 , pp. 933
- Senzaki, Y.¹ Colombo, D.² Gladfelter, W.L.³ McCormick, F.B.⁴

10
- 0001503617
- H. L. Yu, Y. Chi, C. S. Liu, S. M. Peng, G. H. Lee, Chem. Vap. Deposition 2001, 7, 245.
- (2001) Chem. Vap. Deposition , vol.7 , pp. 245
- Yu, H.L.¹ Chi, Y.² Liu, C.S.³ Peng, S.M.⁴ Lee, G.H.⁵

11
- 0036096259
- Y. Chi, H.L. Yu, W.L. Ching, C.S. Liu, Y.L. Chen, T.Y. Chou, S. M. Peng, G. H. Lee, J. Mater. Chem. 2002, 12, 1363.
- (2002) J. Mater. Chem , vol.12 , pp. 1363
- Chi, Y.¹ Yu, H.L.² Ching, W.L.³ Liu, C.S.⁴ Chen, Y.L.⁵ Chou, T.Y.⁶ Peng, S.M.⁷ Lee, G.H.⁸

12
- 0346165465
- S. Rosenberg, A. W. Herlinger, W. S. Mahoney, G. L. Geoffroy, Inorg. Synth. 1989, 25, 187.
- (1989) Inorg. Synth , vol.25 , pp. 187
- Rosenberg, S.¹ Herlinger, A.W.² Mahoney, W.S.³ Geoffroy, G.L.⁴

13
- 37049077019
- H.K. Sanati, A. Becalska, A. K. Ma, R. K. Pomeroy, Chem. Commun. 1990, 2, 197.
- (1990) Chem. Commun , vol.2 , pp. 197
- Sanati, H.K.¹ Becalska, A.² Ma, A.K.³ Pomeroy, R.K.⁴

14
- 0000458045
- L. Pereira, W. K. Leong, S. Y. Wong, J. Organomet. Chem. 2000, 609, 104.
- (2000) J. Organomet. Chem , vol.609 , pp. 104
- Pereira, L.¹ Leong, W.K.² Wong, S.Y.³

15
- 0003821752
- W. Kern, Ed, Noyes: Park Ridge
- W. Kern, (Ed.), Handbook of Semiconductor Wafer Cleaning Technology: Science, Technology, and Applications. Noyes: Park Ridge, 1993.
- (1993) Handbook of Semiconductor Wafer Cleaning Technology: Science, Technology, and Applications

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