OPC for reduced process sensitivity in the double patterning flow

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Gheith, Mohamed ^a   Le, Hong ^a   Word, James ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Double patterning; LELE; OPC; Overlay error

Indexed keywords

CORNER ROUNDING; DOUBLE PATTERNING; FAILURE MECHANISM; IMPROVED PROCESS; LELE; NOVEL SOLUTIONS; OPC; OVERLAY ERROR; REDUCED SENSITIVITY;

TITRATION;

ALIGNMENT;

EID: 65849094540     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814337     Document Type: Conference Paper

References (5)

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2. [2] M. Dusa, et. al., "Pitch Doubling Through Dual Patterning Lithography Challenges in Integration and Litho Budgets", Proc. SPIE (2007),6250-6316 (Pubitemid 47551168)
3. W. Arnold, M. Dusa, "Manufacturing Challenges in Double PatterningLithography",ISSM,MC-233,Sept.2006
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5. David Laidler, Philippe Leray, Koen D'have, Shaunee Cheng, "Sources of Overlay Error in Double Patterning Integration Schemes" , Proc. of SPIE Vol. 6922, 69221E , (2008)