Novel process for low temperature crystallization of a-SiC:H for optoelectronic applications

Journal of Materials Science: Materials in Electronics

Volumn 20, Issue SUPPL. 1, 2009, Pages

  Hossain, Maruf ^a   Perez, Jose Roberto Sanchez ^b   Rivera, Jose Marcel Rodriguez ^b   Gangopadhyay, Keshab ^a   Gangopadhyay, Shubhra ^a  

^a UNIVERSITY OF MISSOURI   (United States)

^b POLYTECHNIC UNIVERSITY OF PUERTO RICO   (Puerto Rico)

Author keywords

[No Author keywords available]

Indexed keywords

A-SIC:H; ALUMINUM THIN FILMS; BAND GAPS; CRYSTALLIZATION PROCESS; HALL MEASUREMENTS; HYDROGENATED AMORPHOUS SILICON CARBIDE; LOW-TEMPERATURE CRYSTALLIZATION; METAL-INDUCED CRYSTALLIZATION; NOVEL PROCESS; OPTOELECTRONIC APPLICATIONS; SI SUBSTRATES; UV-VISIBLE; UV-VISIBLE SPECTRA; UV-VISIBLE SPECTROPHOTOMETER; VISIBLE RANGE;

ABSORPTION; ABSORPTION SPECTROSCOPY; ALUMINUM; AMORPHOUS SILICON; ATOMIC FORCE MICROSCOPY; CRYSTALLIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE;

AMORPHOUS FILMS;

EID: 65549153561     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-008-9647-8     Document Type: Conference Paper

References (16)

1. 2) HIT cell. Conference Record of the IEEE Photovoltaic Specialists Conference, 28th, 7-12 (2000)
2. B. Chandan, N.K. Lakshmi, H. Keisuke, S. Jaran, M. Shinsuke, Y. Akira, K Makoto, Fabrication of microcrystalline cubic silicon carbide/crystalline silicon heterojunction solar cell by hot wire chemical vapor deposition. Jpn. J. Appl. Phys., Part 1 46(1) 1-6 (2007); Regular Papers, Brief Communications & Review Papers
3. S. Ishihara, M. Kitagawa, T. Hirao, J. Appl. Phys. 62(3), 837 (1987)
4. M. Shahidul Haque, H.A. Naseem, W.D. Brown, J. Appl. Phys. 75, 3928 (1994)
5. M. Hossain, H.M. Meyer, H.H. Abu-Safe, H. Naseem, W.D. Brown, J. Mater. Res. 21, 761 (2006)
6. T.P. Drusedau, J. Blasing, Appl. Phys. Lett. 72(12), 1510 (1998)
7. O. Nast, S.R. Wenham, J. Appl. Phys. 88(1), 124 (2000)
8. I. Chambouleyron, F. Fajardo, A.R. Zanatta, Appl. Phys. Lett. 79(20), 3233 (2001)
9. T.J. Konno, R. Sinclair, Mater. Sei. Eng., A 179, 426 (1994)
10. I. Kovács, O. Geszti, P. Harmat, Q Radnóczi, Phys. Status Solidi A 161, 153 (1997)
11. I. Kovács, P. Harmat, A. Sulyok, Q Radnóczi, Thin Solid Films 317, 34 (1998)
12. F. Katsuki, K Hanafusa, M. Yonemura, J. Appl. Phys. 89, 4643 (2001)
13. H. Okumura, T. Akane, Y. Tsubo, S. Matsumoto, J. Electrochem. Soc. 144(11), 3765 (1997)
14. M. Hossain, S. Gangopadhyay, Method for crystallizing amorphous silicon carbide thin films for various applications. Invention disclosure submitted to the University of Missouri
15. M. Hossain, M. Yun, V. Korampally, S. Gangopadhyay, J. Mater. Sei.: Mater. Electron, (to be published)
16. J. Tauc, R. Grigorovici, A. Vancu, Phys. Status Solidi 15, 627 (1966)