On the effect of Ta on improved oxidation resistance of Ti-Al-Ta-N coatings

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 3, 2009, Pages 554-560

  Pfeiler, M ^a   Scheu, C ^b   Hutter, H ^c   Schnoller J ^c   Michotte, C ^d   Mitterer, C ^e   Kathrein, M ^f  

^a MATERIALS CENTER LEOBEN FORSCHUNG GMBH   (Austria)

^b UNIVERSITY OF MUNICH   (Germany)

^c VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^d CERATIZIT Luxemburg S̀rl ^*  (Luxembourg)

^e UNIVERSITY OF LEOBEN   (Austria)

^f CERATIZIT AUSTRIA GMBH   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT AIRS; CATHODIC ARC EVAPORATIONS; ENERGY DISPERSIVE X-RAY SPECTROSCOPIES; LINE SCANS; MASS TRANSPORTS; OXIDATION BEHAVIORS; OXIDE LAYER THICKNESS; OXIDE SCALE; POROUS LAYERS; PROTECTIVE OXIDES; REDUCED OXIDATIONS; REFERENCE MATERIALS; SECONDARY ION MASS SPECTROSCOPIES;

ALUMINUM; DEPTH PROFILING; INORGANIC COATINGS; NITRIDES; OXIDATION; OXIDATION RESISTANCE; OXIDE MINERALS; OXYGEN; OZONE WATER TREATMENT; POWDER COATINGS; SCALE (DEPOSITS); SECONDARY ION MASS SPECTROMETRY; STAINLESS STEEL; TITANIUM DIOXIDE; TITANIUM NITRIDE; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY;

TANTALUM;

EID: 65549123287     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3119671     Document Type: Article

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