Silicon template fabrication for imprint lithography with a very smooth side wall profile

Thin Solid Films

Volumn 517, Issue 14, 2009, Pages 3862-3865

  Kawata, Hiroaki ^a   Matsue, Masato ^a   Kubo, Kensuke ^a   Yasuda, Masaaki ^a   Hirai, Yoshihiko ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

Anisotropic etching; Bosch process; Imprint template; Potassium hydroxide; Scalloping; Silicon deep etching

Indexed keywords

ANISOTROPIC WET ETCHINGS; BOSCH PROCESS; FABRICATION PROCESS; IMPRINT LITHOGRAPHIES; IMPRINT TEMPLATE; LINE PATTERNS; LINE WIDTHS; PATTERN HEIGHTS; PLASMA PROCESS; POTASSIUM HYDROXIDE SOLUTIONS; SCALLOPING; SIDE WALLS; STEP TIME; SWITCHING PROCESS; TEMPLATE FABRICATIONS; VERTICAL SIDE WALLS;

ANISOTROPY; FABRICATION; NANOIMPRINT LITHOGRAPHY; POTASSIUM; POTASSIUM HYDROXIDE; REACTIVE ION ETCHING; SILICON; WALL FLOW; WET ETCHING;

ANISOTROPIC ETCHING;

EID: 65449178728     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.162     Document Type: Article

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