Structural analysis of DC magnetron sputtered and spin coated thin films using RBS, TEM and X-ray reflectivity methods

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 266, Issue 8, 2008, Pages 1548-1552

  Bhatta, Umananda M ^a   Ghatak, J ^a   Mukhopadhyay, Mrinmay ^b,c   Conley, Raymond ^b   Liu, Chian ^b   Satyam, P V ^a  

^a INSTITUTE OF PHYSICS   (India)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Polymer films; RBS; TEM; Thin films; X ray reflectivity

Indexed keywords

MAGNETRON SPUTTERING; MICROELECTRONICS; POLYSTYRENES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON; SPIN COATING; SYNCHROTRON RADIATION; TRANSMISSION ELECTRON MICROSCOPY;

CONTACT LAYERS; INTERFACE ROUGHNESS; X-RAY REFLECTIVITY;

THIN FILMS;

EID: 43049168297     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.12.063     Document Type: Article

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