Thermal effects and plasma damage upon encapsulation of polymer solar cells

Thin Solid Films

Volumn 517, Issue 14, 2009, Pages 4179-4183

  Chen, Tsai Ning ^a   Wuu, Dong Sing ^a   Lin, Chen Yuan ^a   Wu, Chia Cheng ^a   Horng, Ray Hua ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

Barrier structure; Degradation; Plasma damage; Polymer solar cells; TiOx

Indexed keywords

ACTIVE LAYERS; AMBIENT ATMOSPHERES; BARRIER LAYERS; BARRIER STRUCTURE; CONCENTRATION OF; DEPOSITION TEMPERATURES; FILM-DEPOSITION PROCESS; INITIAL VALUES; LOW-POWER; PHOTOCURRENT MEASUREMENTS; PLASMA DAMAGE; PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITIONS; POLYMER SOLAR CELLS; SILICON NITRIDE FILMS; TIOX; UV-VIS ABSORPTION SPECTROSCOPIES;

ABSORPTION; ABSORPTION SPECTROSCOPY; ATOMIC SPECTROSCOPY; CELL MEMBRANES; CONVERSION EFFICIENCY; DEGRADATION; OXIDE FILMS; PHASE SEPARATION; PHOTOVOLTAIC CELLS; PLASMA DEPOSITION; PLASMAS; POLYMER FILMS; POLYMERS; SILICA; SILICON NITRIDE; SILICON OXIDES; SOLAR CELLS; SOLAR ENERGY; THERMAL EFFECTS; ULTRAVIOLET SPECTROSCOPY;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 65449161440     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.02.014     Document Type: Article

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