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Volumn 20, Issue 10, 2009, Pages
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Tailoring particle arrays by isotropic plasma etching: An approach towards percolated perpendicular media
a
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Author keywords
[No Author keywords available]
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Indexed keywords
CO/PT MULTILAYERS;
DOMAIN NUCLEATIONS;
DOMAIN-WALL PINNING;
ETCHING TIME;
ISOTROPIC PLASMAS;
LINEAR DEPENDENCES;
MAGNETIC NANOSTRUCTURES;
MAGNETIC REVERSALS;
PACKED ARRAYS;
PARTICLE ARRAYS;
PARTICLE LOCATIONS;
PARTICLE SYSTEMS;
PERPENDICULAR MAGNETIC ANISOTROPIES;
PERPENDICULAR MEDIAS;
POLYSTYRENE PARTICLES;
SINGLE DOMAINS;
SUB-50 NM;
MAGNETIC ANISOTROPY;
MAGNETIC MULTILAYERS;
NANOSTRUCTURES;
PLASMA ETCHING;
PLASMAS;
POLYSTYRENES;
MAGNETIC BUBBLES;
NANOMATERIAL;
POLYSTYRENE;
COBALT;
PLATINUM;
ANISOTROPY;
ARTICLE;
CHEMICAL REACTION;
FILM;
MAGNETISM;
PARTICLE SIZE;
PERIODICITY;
PRIORITY JOURNAL;
ARTIFICIAL MEMBRANE;
CHEMISTRY;
CONFORMATION;
CRYSTALLIZATION;
MACROMOLECULE;
MATERIALS TESTING;
METHODOLOGY;
NANOTECHNOLOGY;
SURFACE PROPERTY;
ULTRASTRUCTURE;
ANISOTROPY;
COBALT;
CRYSTALLIZATION;
MACROMOLECULAR SUBSTANCES;
MAGNETICS;
MATERIALS TESTING;
MEMBRANES, ARTIFICIAL;
MOLECULAR CONFORMATION;
NANOSTRUCTURES;
NANOTECHNOLOGY;
PARTICLE SIZE;
PLATINUM;
SURFACE PROPERTIES;
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EID: 65449159034
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/20/10/105304 Document Type: Article |
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Times cited : (24)
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References (31)
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