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Volumn 517, Issue 14, 2009, Pages 3947-3949
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Selective liquid phase deposition of silicon oxide at low temperature for nanometer-scale structures
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Author keywords
Low temperature deposition; Nanometer scale structure; Plasma downstream ashing; Selective liquid phase deposition; Silicon oxide (SiO2)
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Indexed keywords
LINE AND SPACES;
LOW TEMPERATURE DEPOSITION;
LOW TEMPERATURES;
NANO-METER SCALE;
NANOMETER-SCALE STRUCTURE;
PHOTORESIST PATTERNS;
SELECTIVE LIQUID PHASE DEPOSITION;
SEMICONDUCTOR DEVICE FABRICATIONS;
SILICON SUBSTRATES;
STEP COVERAGES;
CHEMICAL STABILITY;
DEPOSITION;
LIQUIDS;
NONMETALS;
OXIDE FILMS;
PHOTORESISTORS;
PHOTORESISTS;
PLASMA DEPOSITION;
PLASMAS;
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SILICA;
SILICON COMPOUNDS;
SPACE PLATFORMS;
SURFACE TREATMENT;
SILICON OXIDES;
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EID: 65449147381
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2009.01.105 Document Type: Article |
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Times cited : (2)
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References (12)
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