A self-templated route to hollow silica microspheres

Journal of Physical Chemistry C

Volumn 113, Issue 8, 2009, Pages 3168-3175

  Zhang, Tierui ^a   Zhang, Qiao ^a   Ge, Jianping ^a   Goebl, James ^a   Sun, Minwei ^a   Yan, Yushan ^a   Liu, Yi Sheng ^b,c   Chang, Chinglin ^b   Guo, Jinghua ^c   Yin, Yadong ^a  

^a University of California Riverside   (United States)

^b TAMKANG UNIVERSITY   (Taiwan)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION DESORPTIONS; CONCENTRATION OF; FOURIER TRANSFORM INFRARED SPECTROMETRIES; HOLLOW SILICA SPHERES; HOLLOW STRUCTURES; PARTIAL DISSOLUTIONS; RE DEPOSITIONS; REACTION CONDITIONS; SEM; SHELL FORMATIONS; SILICA COLLOIDS; SILICA CORES; SILICA MICROSPHERES; SILICA SHELLS; SILICATE SPECIES; TEM; TEMPLATED; TRANSFORMATION MECHANISMS; WALL THICKNESS; X-RAY ABSORPTION SPECTROSCOPIES; X-RAY DIFFRACTIONS;

ADSORPTION; COLLOID CHEMISTRY; DESORPTION; DISSOLUTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; MICROSPHERES; SCANNING ELECTRON MICROSCOPY; SILICA; SILICATES; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY; X RAY SPECTROSCOPY;

ABSORPTION SPECTROSCOPY;

EID: 65249189452     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp810360a     Document Type: Article

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