Ion beam figuring for lithography optics

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 267, Issue 8-9, 2009, Pages 1390-1393

  Weiser, Martin ^a  

^a CARL ZEISS SMT AG   (Germany)

Author keywords

Ion beam figuring; Optical lithography; Photolithography; Ultra precision surfaces

Indexed keywords

ABERRATION CONTROLS; ASPHERICAL; DESIGN QUALITIES; ELECTRONIC CIRCUITS; HIGH QUALITIES; IMAGING OPTICS; ION BEAM FIGURING; KEY TECHNOLOGIES; LITHOGRAPHY TOOLS; MASS MANUFACTURING; MOORE'S LAWS; OPTICAL LITHOGRAPHY; OPTICAL SURFACES; SEMICONDUCTOR INDUSTRIES; TIME TO MARKETS; TOLERANCE REQUIREMENTS; ULTRA-PRECISION SURFACES;

ELECTRIC CONDUCTIVITY; ELECTRON TUBES; ELECTRONICS INDUSTRY; INTEGRATED CIRCUITS; ION BEAMS; ION BOMBARDMENT; IONS; LAWS AND LEGISLATION; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR MATERIALS;

BEAM PLASMA INTERACTIONS;

EID: 65249176932     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2009.01.051     Document Type: Article

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