Micro and nano patterning by focused ion beam enhanced adhesion

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 267, Issue 8-9, 2009, Pages 1376-1380

  Shukla, Neeraj ^a   Tripathi, Sarvesh K ^a   Sarkar, Mihir ^a   Rajput, Nitul S ^a   Kulkarni, Vishwas N ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

Author keywords

EDS; Focused ion beam; Nano pattern generation; SEM; Thin film adhesion

Indexed keywords

BEAM CURRENTS; EDS; MICRO PATTERNS; MICRO-AND NANO-PATTERNING; NANO PATTERN GENERATION; SELECTIVE IRRADIATIONS; SEM; SI SUBSTRATES; THIN FILM ADHESION; THIN METALLIC FILMS;

ADHESION; BEAM PLASMA INTERACTIONS; EXPLOSIVE ACTUATED DEVICES; FOCUSED ION BEAMS; GALLIUM ALLOYS; IONS; SEMICONDUCTING SILICON COMPOUNDS; SILICON COMPOUNDS; SUBSTRATES; THIN FILM DEVICES; THIN FILMS;

ION BOMBARDMENT;

EID: 65249114850     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2009.01.048     Document Type: Article

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