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Volumn 267, Issue 8-9, 2009, Pages 1680-1683
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Microstructure of Ti thin films formed by energetic physical vapour deposition processes
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Author keywords
Diffusion; PIII; PVD; SEM; Ti
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Indexed keywords
BULK TRANSPORTS;
COLUMNAR MICROSTRUCTURES;
HIGH-ENERGY IONS;
INTERFACE REACTIONS;
ION-BEAM SPUTTERING;
LOWER AVERAGES;
OXIDE FORMATIONS;
PARTICLE ENERGIES;
PHYSICAL VAPOUR DEPOSITIONS;
PIII;
PRIMARY IONS;
PVD;
SEM;
SUBSTRATE TEMPERATURES;
THIN-FILM MICROSTRUCTURES;
TI;
TI THIN FILMS;
TITANIUM THIN FILMS;
VACUUM ARC DEPOSITIONS;
IONS;
LANTHANUM COMPOUNDS;
MICROSTRUCTURE;
SPUTTERING;
THIN FILM DEVICES;
THIN FILMS;
TITANIUM;
VACUUM DEPOSITION;
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EID: 65249084070
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2009.01.102 Document Type: Article |
Times cited : (3)
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References (21)
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