Influence of ion energy on properties of Mg alloy thin films formed by ion beam sputter deposition

Surface and Coatings Technology

Volumn 200, Issue 22-23 SPEC. ISS., 2006, Pages 6527-6532

  Bohne, Y ^a   Seeger, D M ^b   Blawert, C ^b   Dietzel, W ^b   Mandl S ^a   Rauschenbach, B ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

^b INSTITUTE OF MATERIALS RESEARCH   (Germany)

Author keywords

Corrosion properties; Ion beam sputtering; Magnesium alloys; SIMS investigation

Indexed keywords

AMORPHOUS MATERIALS; COOLING; CORROSION RESISTANCE; ION BEAM ASSISTED DEPOSITION; ION BEAMS; POLARIZATION; SILICON; SPUTTER DEPOSITION; THIN FILMS;

ARGON IONS; FINE-GRAINED ALLOYS; ION BEAM SPUTTERING; MICROCRYSTALLINE TEXTURED FILMS; POLARIZATION RESISTANCE; SPUTTER ANGLE DISTRIBUTION; THIN FILM DEPOSITION;

MANGANESE ALLOYS;

AMORPHOUS MATERIALS; COOLING; CORROSION RESISTANCE; ION BEAM ASSISTED DEPOSITION; ION BEAMS; MANGANESE ALLOYS; POLARIZATION; SILICON; SPUTTER DEPOSITION; THIN FILMS;

EID: 33646126713     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.11.088     Document Type: Article

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