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Volumn 57, Issue 9, 2009, Pages 2607-2612

Continuous in situ functionally graded silicon nitride materials

Author keywords

Ceramics; Functionally graded materials; Hardness; Spark plasma sintering; Toughness

Indexed keywords

CERAMICS; FIELD-ASSISTED SINTERING; GRAIN SIZES; HOMOGENEOUS POWDERS; IN-SITU; MANUFACTURING PROCESS; MASS PRODUCTIONS; NITRIDE MATERIALS; OPERATING CONDITIONS; PHASE CONTENTS; SCALING-UP; TEMPERATURE PROFILES;

EID: 64849108807     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2009.01.043     Document Type: Article
Times cited : (51)

References (35)
  • 17
    • 64849085540 scopus 로고    scopus 로고
    • Japanese patent, number JP2001220247, Sintering die for electrical sintering
    • Japanese patent, number JP2001220247, "Sintering die for electrical sintering".
  • 18
    • 64849105387 scopus 로고    scopus 로고
    • Japanese patent, number JP2006118033, Method for producing compositionally gradient cemented carbides
    • Japanese patent, number JP2006118033, "Method for producing compositionally gradient cemented carbides".


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.