Benefits of zero degree single wafer high energy implants for advanced semiconductor device fabrication

AIP Conference Proceedings

Volumn 1066, Issue , 2008, Pages 261-264

  Lee, Woojin ^a   Thanigaivelan, Thirumal ^a   Gossmann, Hans Joachim ^a   Low, Russell ^a   Colombeau, Benjamin ^a   Lacey, Kerry ^a   Merrill, Mark ^a   Renau, Anthony ^a  

^a VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES   (United States)

Author keywords

Inter well isolation; Shadowing effect; Zero degree implant

Indexed keywords

EID: 64849089520     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.3033608     Document Type: Conference Paper

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