Tetramethyl ammonium as masking agent for molecular stencil patterning in the confined space of the nano-channels of 2D hexagonal-templated porous silicas

Physical Chemistry Chemical Physics

Volumn 11, Issue 16, 2009, Pages 2912-2921

  Zhang, Kun ^a,b   Albela, Belén ^a   He, Ming Yuan ^b   Wang, Yimeng ^b   Bonneviot, Laurent ^a  

^a UNIVERSITÉ DE LYON   (France)

^b EAST CHINA NORMAL UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 64549161206     PISSN: 14639076     EISSN: None     Source Type: Journal    
DOI: 10.1039/b819872c     Document Type: Article

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