On-site fabrication of crystalline cerium oxide films and patterns by ink-jet deposition method at moderate temperatures

Journal of the American Ceramic Society

Volumn 91, Issue 7, 2008, Pages 2083-2087

  Gallage, Ruwan ^a   Matsuo, Atsushi ^a   Fujiwara, Takeshi ^a   Watanabe, Tomoaki ^a   Matsushita, Nobuhiro ^a   Yoshimura, Masahiro ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CERIUM OXIDES; DIRECT-PATTERNING; FREE OF CRACKS; INK-JET DEPOSITIONS; INK-JET TECHNIQUES; MODERATE TEMPERATURES; NANO-SIZED; POST-TREATMENTS; SCANNING ELECTRONS; SINGLE-STEP PROCESS; SITE FABRICATIONS;

CERIUM; CERIUM COMPOUNDS; CRYSTALLINE MATERIALS; INK; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

OXIDE FILMS;

EID: 64549132973     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2008.02402.x     Document Type: Article

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