Studies on the surface morphology and orientation of CeO2 films deposited by pulsed laser ablation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 11, 1998, Pages 6161-6169

  Develos, Katherine D ^a   Kusunoki, Masanobu ^a   Ohshima, Shigetoshi ^a  

^a YAMAGATA UNIVERSITY   (Japan)

Author keywords

Al2O3; CeO2; Critical thickness; Morphology; Orientation; Pulsed laser ablation

Indexed keywords

ALUMINA; ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; DEPOSITION; FILM GROWTH; LASER ABLATION; MORPHOLOGY; PULSED LASER APPLICATIONS; SUBSTRATES; SURFACE ROUGHNESS;

CERIUM DIOXIDE; PULSED LASER ABLATION (PLA);

CERIUM COMPOUNDS;

EID: 0032202931     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6161     Document Type: Article

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