Resistive oxygen sensors using cerium oxide thin films prepared by metal organic chemical vapor deposition and sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 10, 2004, Pages 6920-6924

  Izu, Noriya ^a   Murayama, Norimitsu ^a   Shin, Woosuck ^a   Matsubara, Ichiro ^a   Kanzaki, Shuzo ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Ceria; Metal organic chemical vapor deposition (MOCVD); Resistive oxygen gas sensor; Response time; Sputtering

Indexed keywords

CERIUM COMPOUNDS; CRYSTAL STRUCTURE; DETERIORATION; ELECTRIC CHARGE; ELECTRIC RESISTANCE; ELECTRON TRAPS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXYGEN SENSORS; SPUTTERING; SYNTHESIS (CHEMICAL);

CERIA; DEPOSITION TEMPERATURE; INTERDIGITAL STRUCTURES; RESISTIVE OXYGEN GAS SENSORS;

THIN FILMS;

EID: 10844237865     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.6920     Document Type: Article

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