Ammonia sensitivity of rf sputtered tellurium oxide thin films

Sensors and Actuators, B: Chemical

Volumn 138, Issue 2, 2009, Pages 550-555

  Siciliano, T ^a   Di Giulio, M ^a   Tepore, M ^a   Filippo, E ^a   Micocci, G ^a   Tepore, A ^a  

^a UNIVERSITY OF SALENTO   (Italy)

Author keywords

Gas sensors; rf sputtering; Tellurium oxide

Indexed keywords

AMMONIA GAS; CHEMICAL COMPOSITIONS; CONCENTRATION LEVELS; ENERGY DISPERSIVE X-RAY SPECTROSCOPIES; GAS CONCENTRATIONS; GAS SENSORS; OPERATING TEMPERATURES; POLY-CRYSTALLINE; POWER LAW RELATIONSHIPS; QUARTZ SUBSTRATES; RECOVERY TIME; RF REACTIVE SPUTTERING; RF SPUTTERING; SEM; SENSITIVITY PROPERTIES; TELLURIUM OXIDE; TELLURIUM TARGETS; X-RAY DIFFRACTIONS;

AMMONIA; CHEMICAL SENSORS; GAS DETECTORS; GASES; NONMETALS; OXIDE MINERALS; QUARTZ; RANGE FINDING; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; TELLURIUM; TELLURIUM COMPOUNDS; THIN FILMS;

OXIDE FILMS;

EID: 64549110659     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2009.02.068     Document Type: Article

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