Room temperature NO2 sensing properties of reactively sputtered TeO2 thin films

Sensors and Actuators, B: Chemical

Volumn 137, Issue 2, 2009, Pages 644-648

  Siciliano, T ^a   Di Giulio, M ^a   Tepore, M ^a   Filippo, E ^a   Micocci, G ^a   Tepore, A ^a  

^a UNIVERSITY OF SALENTO   (Italy)

Author keywords

Gas sensors; Rf sputtering; Tellurium oxide

Indexed keywords

ANNEALING; ELECTRODEPOSITION; ENERGY GAP; GAS DETECTORS; GAS SENSING ELECTRODES; GASES; OXIDE MINERALS; QUARTZ; SENSORS; SOLIDS; TELLURIUM; TELLURIUM COMPOUNDS; THIN FILMS;

ANNEALED SAMPLES; AS-DEPOSITED FILMS; ENERGY GAP VALUES; GAS SENSORS; GAS-SENSING; METAL TARGETS; OPTICAL ENERGY-GAPS; PHASE IDENTIFICATIONS; QUARTZ SUBSTRATES; REFLECTANCE SPECTRUM; RF SPUTTERING; ROOM TEMPERATURES; SENSING PROPERTIES; TELLURIUM OXIDE; THERMAL-ANNEALING; X-RAY DIFFRACTIONS;

AMORPHOUS FILMS;

EID: 62649160932     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2008.12.004     Document Type: Article

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