Diffusion of hydrogen from a microwave plasma into diamond and its interaction with dopants and defects

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 316-322

  Uzan Saguy, C ^a   Cytermann, C ^a   Fizgeer, B ^a   Richter, V ^a   Avigal, Y ^a   Shaanan, M ^a   Brener, R ^a   Kalish, R ^a   Bustarret, E ^b   Chevallier, J ^b  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b CNRS   (France)

Author keywords

B doping; Defects; Hydrogen diffusion; Passivation

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; DIAMONDS; DIFFUSION IN GASES; HYDROGEN; ION IMPLANTATION; SECONDARY ION MASS SPECTROMETRY; SINGLE CRYSTALS;

DOPANTS;

PLASMA INTERACTIONS;

DIAMOND;

EID: 6444245010     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00676-8     Document Type: Article

References (12)