Diffusion and thermal stability of hydrogen in homoepitaxial CVD diamond films

Diamond and Related Materials

Volumn 9, Issue 3, 2000, Pages 1171-1174

  Ballutaud, D ^a   Jomard, F ^a   Le Duigou, J ^a   Theys, B ^a   Chevallier, J ^a   Deneuville, A ^b   Pruvost, F ^b  

^a Centre National de la Recherche Scientifique   (France)

^b LABORATOIRE DE CRISTALLOGRAPHIE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; BORON; CHEMICAL VAPOR DEPOSITION; DISSOCIATION; EPITAXIAL GROWTH; HYDROGEN; THERMODYNAMIC STABILITY;

HOMOEPITAXY;

DIAMOND FILMS;

EID: 0033729081     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00273-3     Document Type: Article

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