Initiated chemical vapor deposition of polymer films on nonplanar substrates

Thin Solid Films

Volumn 517, Issue 12, 2009, Pages 3536-3538

  Baxamusa, Salmaan H ^a   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology   (United States)

Author keywords

Conformal; Initiated chemical vapor deposition; Patterns; Polymers; Step coverage

Indexed keywords

ANALYTICAL MODELS; ASPECT RATIO TRENCHES; CONFORMAL; CONFORMALITY; INITIATED CHEMICAL VAPOR DEPOSITION; MICROTRENCHES; NON-PLANAR SUBSTRATES; NONPLANAR GEOMETRIES; PATTERNS; STEP COVERAGE; STICKING PROBABILITIES; SURFACE CONCENTRATIONS; THIN POLYMER FILMS; VAPOR-PHASE;

ASPECT RATIO; CHEMICAL VAPOR DEPOSITION; FREE RADICAL POLYMERIZATION; MONOMERS; PLASTIC FILMS; POLYMERS; SUBSTRATES; VAPORS;

POLYMER FILMS;

EID: 64349119981     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.032     Document Type: Article

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