Influence of temperature and layers on the characterization of ITO films

Journal of Materials Processing Technology

Volumn 209, Issue 8, 2009, Pages 3943-3948

  Liu, Jiaxiang ^a   Wu, Da ^a   Zeng, Shengnan ^a  

^a BEIJING UNIVERSITY OF CHEMICAL TECHNOLOGY   (China)

Author keywords

Heat treatment; ITO precursor solution; Photoelectric properties; Sol gel method

Indexed keywords

AFM; COATING LAYERS; DIP COATINGS; ELECTRICAL AND OPTICAL PROPERTIES; FOUR-POINT PROBE METHODS; GRAIN SIZES; HEATING TEMPERATURES; INDIUM TIN OXIDE FILMS; ITO FILMS; ITO PRECURSOR SOLUTION; OPTICAL TRANSMITTANCES; PHOTOELECTRIC PROPERTIES; QUARTZ GLASS SUBSTRATES; SOL-GEL METHOD; XRD;

ELECTRIC RESISTANCE; GELATION; GELS; HEAT TREATING FURNACES; HEAT TREATMENT; HEATING; INDIUM; OPACITY; OXIDE FILMS; OXIDE MINERALS; PHOTOELECTRICITY; PHOTOLITHOGRAPHY; QUARTZ; SHEET RESISTANCE; SOL-GEL PROCESS; SOL-GELS; SOLS; TIN; TITANIUM COMPOUNDS;

OPTICAL FILMS;

EID: 64249171328     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmatprotec.2008.09.016     Document Type: Article

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