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Volumn 209, Issue 9, 2009, Pages 4390-4394

A method of etching and powder blasting for microholes on brittle materials

Author keywords

Brittle material; Mask; Photosensitive resin; Powder blasting

Indexed keywords

BRITTLE MATERIAL; CHEMICAL-ETCHING PROCESS; DESIRED POSITIONS; EROSION RATES; HIGH RESISTANCES; INNER LAYERS; MACHINING METHODS; MICRO-HOLES; PHOTO ETCHINGS; PHOTOSENSITIVE RESIN; POWDER BLASTING; PRINTING METHODS; PROTECTIVE LAYERS; RATE OF PRODUCTIONS; SECOND LAYERS; SUBSTRATE MATERIALS; TWO LAYERS; WET AND DRIES;

EID: 64249112082     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmatprotec.2008.11.032     Document Type: Article
Times cited : (8)

References (10)
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  • 2
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  • 4
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  • 5
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  • 6
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    • Determination of mask opening size in creating fluid hole on brittle material by double-side powder blasting
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    • Study on the photoelectrochemical etching process of semiconducting 6H-SiC wafer
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.