Study on the photoelectrochemical etching process of semiconducting 6H-SiC wafer

Materials Science and Engineering: B

Volumn 95, Issue 3, 2002, Pages 191-194

  Shin, Moo Whan ^a   Song, Jung Gyun ^a  

^a Myong Ji University   (South Korea)

Author keywords

Electrolyte; Etching rate; Photoelectrochemical etching; SiC

Indexed keywords

ANISOTROPY; ELECTRIC FIELD EFFECTS; ELECTROCHEMISTRY; ELECTROLYTES; ENERGY DISPERSIVE SPECTROSCOPY; ETCHING; HYDROFLUORIC ACID; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; SURFACE ROUGHNESS; THERMOOXIDATION;

PHOTOELECTROCHEMICAL ETCHING;

SILICON CARBIDE;

EID: 0036723472     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(02)00163-0     Document Type: Article

References (7)