Characterization of NiO thin film grown by two-step processes

Physica B: Condensed Matter

Volumn 404, Issue 8-11, 2009, Pages 1058-1060

  Wang, Xin ^a   Li, Ye ^a   Wang, GuoZheng ^a   Xiang, Rong ^a   Jiang, DeLong ^a   Fu, ShenCheng ^a   Wu, Kui ^a   Yang, XiaoYu ^a   DuanMu, QingDuo ^a   Tian, JingQuan ^a   Fu, LiChen ^a  

^a CHANGCHUN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Absorption spectra; Hall measurement; Nickel oxide; Oxidation; Vacuum evaporation; X ray diffraction

Indexed keywords

ELECTRICAL AND OPTICAL PROPERTIES; GLASS SUBSTRATES; HALL MEASUREMENT; NI THIN FILMS; NIO THIN FILMS; OPTICAL ABSORPTION EDGES; OPTICAL AND ELECTRICAL PROPERTIES; OXIDATION PROCESS; OXIDATION TEMPERATURES; P-TYPE NIO; TWO-STEP PROCESS; VACUUM EVAPORATION METHODS;

ABSORPTION; CARRIER CONCENTRATION; DIFFRACTION; ELECTRIC PROPERTIES; LIGHT ABSORPTION; NICKEL; NICKEL ALLOYS; NICKEL OXIDE; OPTICAL PROPERTIES; OXIDATION; OXIDE MINERALS; QUARTZ; SPECTRUM ANALYSIS; THIN FILM DEVICES; THIN FILMS; VACUUM; VACUUM EVAPORATION; VAPOR DEPOSITION; VAPORS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

OPTICAL FILMS;

EID: 64149132470     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2008.10.059     Document Type: Article

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