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Volumn 54, Issue 14, 2009, Pages 3781-3787

Impedance model of electrolyte-insulator-semiconductor structure with porous silicon semiconductor

Author keywords

Capacitance; Conductance; Impedance model; Photoelectrode; Porous silicon; Porous silicon nitrided TiO2 structure; Porous silicon polyaniline structure

Indexed keywords

APPLIED BIAS; CONDUCTANCE; CONSTANT PHASE ELEMENTS; ELECTROLYTE INSULATOR SEMICONDUCTORS; IMPEDANCE MODEL; IMPEDANCE SPECTRUM; INTERFACIAL LAYERS; MEASUREMENT TOOLS; MESH STRUCTURES; PHOTOELECTRODE; PHYSICAL MODELS; POROUS STRUCTURES; SEMICONDUCTOR INTERFACES; SILICON MICROCHANNELS;

EID: 64049115487     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.01.071     Document Type: Article
Times cited : (16)

References (39)
  • 17
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    • Technical Report 26, USA
    • F. Mansfeld, Analysis and interpretation of EIS data for metals and alloys, Technical Report 26, USA, 1993.
    • (1993)
    • Mansfeld, F.1
  • 18
    • 0003619759 scopus 로고
    • Identification of electrochemical processes by frequency response analyser
    • Technical report 004/83, France
    • C. Gabrielli, Identification of electrochemical processes by frequency response analyser, Technical report 004/83, France, 1984.
    • (1984)
    • Gabrielli, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.