Thermal reaction of SiC films with Mo, Re and Mo-Re alloy

Journal of Alloys and Compounds

Volumn 475, Issue 1-2, 2009, Pages 635-642

  Roger, Jérome ^a,b   Audubert, Fabienne ^b   Le Petitcorps, Yann ^a  

^a UNIVERSITÉ DE BORDEAUX   (France)

^b IRFM   (France)

Author keywords

CVD; Diffusion; Molybdenum; Rhenium; Silicon carbide

Indexed keywords

ACTIVATION ENERGY; BINARY ALLOYS; CHEMICAL VAPOR DEPOSITION; DIFFUSION; ELECTRON PROBE MICROANALYSIS; MOLYBDENUM; MOLYBDENUM ALLOYS; REACTION KINETICS; RHENIUM; RHENIUM COMPOUNDS; SILICIDES; SILICON ALLOYS; SILICON CARBIDE; SOLID STATE REACTIONS; SUBSTRATES; X RAY DIFFRACTION;

APPARENT ACTIVATION ENERGY; CHEMICAL VAPOUR DEPOSITION; DIFFUSION KINETICS; METAL SUBSTRATE; SYNERGIC EFFECTS; TETRAMETHYLSILANE; THERMAL REACTIONS; THERMAL-ANNEALING;

RHENIUM ALLOYS;

EID: 63949083297     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.07.141     Document Type: Article

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